IC1000? CMP Polishing Pads

The IC1000? series of pads for chemical mechanical planarization (CMP) is the industry standard. DuPont’s IC1000? pads are used in a wide variety of CMP applications today. While the IC1000? formulation has remained constant, the quality and consistency of the product offerings have been improved continuously for over 20 years. Popular pads in this family include the IC1000? CMP pad and the IC1010? CMP pad.

  • Benefits:

    • Industry standard hard pad for multiple applications
    • World-class quality and performance consistency

    Applications:

    • Copper bulk, Tungsten, STI/Ceria, Oxide, Buff

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